Congratulations, Jack!
I am happy to share that Restek’s own Jack Cochran has recently been awarded the North American Chemical Residue Workshop (NACRW) George and Wilma Fong Award. This award is given to individuals in recognition of their service to the workshop. This service award is named after the founders and organizers of the meeting, George and Wilma Fong, who were also the inaugural award recipients. This award was introduced in 2011 when George and Wilma officially retired from organizing the meeting…after 48 years! Jack first attended the workshop in 2000 and has been volunteering and helping to shape the meeting ever since…even happily participating in the annual “wave” photo…taken by George. Jack has also served as the President of the meeting in 2010 and was chosen to serve on the Board of Directors for NACRW starting in 2015.

I know Jack was excited to see George and Wilma attending the workshop this year as were many long time attendees.

George, Jack and Wilma (left to right).

Join the NACRW LinkedIn page too!

Photo credit George Fong.

Tags: award, FPRW, Jack Cochran, NACRW, pesticide residues

This entry was posted on Wednesday, August 5th, 2015 at 8:24 pm and is filed under Conferences, Miscellaneous, Pesticides. You can follow any responses to this entry through the RSS 2.0 feed. You can leave a response, or trackback from your own site.